Fast imaging of laser induced plasma emission of vanadium dioxide (VO2) target

Abstract

The main objective of this study is to fully optimise the synthesis of vanadium oxide nanostructures using pulsed laser deposition. We will attempt to realise this by studying the mechanism of the plasma formation and expansion during the pulsed laser deposition process of vanadium oxide, since the source of the films is a laser- generated plasma composed of neutrals and ionised atoms, molecules and other species. In this poster presentation, a spatio-temporal evolution study of different species such as VI (437.85 nm), VII (326.1 nm), VIII (237.1 nm) and VO (608.56 nm) are presented and compared.