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Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view
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| dc.contributor.author |
Modibedi, Remegia M
|
|
| dc.date.accessioned | 2012-04-13T10:07:56Z | |
| dc.date.available | 2012-04-13T10:07:56Z | |
| dc.date.issued | 2011-09 | |
| dc.identifier.citation | Modibedi, M. Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view. CSIR-United States (US) Department of State and Joint Services, Science and Technology (S&T) workshop, CSIR, Pretoria, September 2011 | en_US |
| dc.identifier.uri | http://hdl.handle.net/10204/5753 | |
| dc.description | CSIR-United States (US) Department of State and Joint Services, Science and Technology (S&T) workshop, CSIR, Pretoria, September 2011 | en_US |
| dc.description.abstract | Electrochemical atomic layer deposition technique is selected as one of the methods to prepare thin films for various applications, including electrocatalytic materials and compound. | en_US |
| dc.language.iso | en | en_US |
| dc.relation.ispartofseries | Workflow;8110 | |
| dc.subject | Crystalline thin films | en_US |
| dc.subject | Electrochemical atomic layers | en_US |
| dc.subject | Electrocatalytic materials | en_US |
| dc.subject | Electrochemical atomic layer deposition | en_US |
| dc.subject | ECALD | en_US |
| dc.title | Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view | en_US |
| dc.type | Conference Presentation | en_US |
| dc.identifier.apacitation | Modibedi, R. M. (2011). Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view. http://hdl.handle.net/10204/5753 | en_ZA |
| dc.identifier.chicagocitation | Modibedi, Remegia M. "Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view." (2011): http://hdl.handle.net/10204/5753 | en_ZA |
| dc.identifier.vancouvercitation | Modibedi RM, Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view; 2011. http://hdl.handle.net/10204/5753 . | en_ZA |
| dc.identifier.ris | TY - Conference Presentation AU - Modibedi, Remegia M AB - Electrochemical atomic layer deposition technique is selected as one of the methods to prepare thin films for various applications, including electrocatalytic materials and compound. DA - 2011-09 DB - ResearchSpace DP - CSIR KW - Crystalline thin films KW - Electrochemical atomic layers KW - Electrocatalytic materials KW - Electrochemical atomic layer deposition KW - ECALD LK - https://researchspace.csir.co.za PY - 2011 T1 - Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view TI - Crystalline thin films: The electrochemical atomic layer deposition (ECALD) view UR - http://hdl.handle.net/10204/5753 ER - | en_ZA |
