ResearchSpace

Development of Cu2O thin films under the influence of electrochemical impedance: Applications in improved photoelectrochemical water reduction

Show simple item record

dc.contributor.author Shyamal, S
dc.contributor.author Maity, Arjun
dc.contributor.author Satpati, AK
dc.contributor.author Bhattacharya, C
dc.date.accessioned 2019-10-09T09:20:33Z
dc.date.available 2019-10-09T09:20:33Z
dc.date.issued 2019-06
dc.identifier.citation Shyamal, S. et al. 2019. Development of Cu2O thin films under the influence of electrochemical impedance: Applications in improved photoelectrochemical water reduction. Electrochimica Acta, vol. 308, pp. 384-391 en_US
dc.identifier.issn 22682
dc.identifier.issn 0013-4686
dc.identifier.issn 1873-3859
dc.identifier.uri https://www.sciencedirect.com/science/article/pii/S0013468619306656
dc.identifier.uri https://doi.org/10.1016/j.electacta.2019.03.231
dc.identifier.uri http://hdl.handle.net/10204/11159
dc.description Copyright: 2019 Elsevier. Due to copyright restrictions, the attached PDF file only contains the abstract of the full text item. For access to the full text item, please consult the publisher's website. The definitive version of the work is published in Electrochimica Acta, vol. 308, pp. 384-391 en_US
dc.description.abstract An impedance assisted novel electrochemical technique has been employed to develop copper oxide (Cu2O) thin films on F-doped tin oxide (FTO)-coated glass substrate. Application of various potentials (-0.60 to -0.40 vs (Ag/AgCl)/V) in the presence of different ranges of frequency can lead to the attainment of high-quality Cu2O crystallites. The dependency of the frequency boundary (i.e. in terms of deposition time) with structural, morphological, optical and photoelectrochemical (PEC) behavior of the Cu2O thin films have been studied. The PEC performance of the optimized Cu2O electrode significantly enhances the water reduction photocurrent to -2.9 mA cm-2. The Cu2O thin film developed in this study exhibits superior photoelectrochemical performance in comparison with the conventionally electrodeposited materials. en_US
dc.language.iso en en_US
dc.publisher Elsevier en_US
dc.relation.ispartofseries Workflow;22682
dc.subject Cu2O semiconductor en_US
dc.subject Electrodeposition en_US
dc.subject Impedance assistance en_US
dc.subject Water reduction en_US
dc.title Development of Cu2O thin films under the influence of electrochemical impedance: Applications in improved photoelectrochemical water reduction en_US
dc.type Article en_US
dc.identifier.apacitation Shyamal, S., Maity, A., Satpati, A., & Bhattacharya, C. (2019). Development of Cu2O thin films under the influence of electrochemical impedance: Applications in improved photoelectrochemical water reduction. http://hdl.handle.net/10204/11159 en_ZA
dc.identifier.chicagocitation Shyamal, S, Arjun Maity, AK Satpati, and C Bhattacharya "Development of Cu2O thin films under the influence of electrochemical impedance: Applications in improved photoelectrochemical water reduction." (2019) http://hdl.handle.net/10204/11159 en_ZA
dc.identifier.vancouvercitation Shyamal S, Maity A, Satpati A, Bhattacharya C. Development of Cu2O thin films under the influence of electrochemical impedance: Applications in improved photoelectrochemical water reduction. 2019; http://hdl.handle.net/10204/11159. en_ZA
dc.identifier.ris TY - Article AU - Shyamal, S AU - Maity, Arjun AU - Satpati, AK AU - Bhattacharya, C AB - An impedance assisted novel electrochemical technique has been employed to develop copper oxide (Cu2O) thin films on F-doped tin oxide (FTO)-coated glass substrate. Application of various potentials (-0.60 to -0.40 vs (Ag/AgCl)/V) in the presence of different ranges of frequency can lead to the attainment of high-quality Cu2O crystallites. The dependency of the frequency boundary (i.e. in terms of deposition time) with structural, morphological, optical and photoelectrochemical (PEC) behavior of the Cu2O thin films have been studied. The PEC performance of the optimized Cu2O electrode significantly enhances the water reduction photocurrent to -2.9 mA cm-2. The Cu2O thin film developed in this study exhibits superior photoelectrochemical performance in comparison with the conventionally electrodeposited materials. DA - 2019-06 DB - ResearchSpace DP - CSIR KW - Cu2O semiconductor KW - Electrodeposition KW - Impedance assistance KW - Water reduction LK - https://researchspace.csir.co.za PY - 2019 SM - 22682 SM - 0013-4686 SM - 1873-3859 T1 - Development of Cu2O thin films under the influence of electrochemical impedance: Applications in improved photoelectrochemical water reduction TI - Development of Cu2O thin films under the influence of electrochemical impedance: Applications in improved photoelectrochemical water reduction UR - http://hdl.handle.net/10204/11159 ER - en_ZA


Files in this item

Thumbnail
Name: Maity3_2019_Abstr ...
Size: 181.1Kb
Format: PDF
View/Open

This item appears in the following Collection(s)

Show simple item record